[IEEE 2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2017.5.15-2017.5.18)] 2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - In-line control of material properties of SiOC:H based low-k dielectrics utilizing optical metrology AM: Advanced metrology
Urbanowicz, Adam M., Ebersbach, Peter, Likhachev, Dmitriy, Mezerette, David, Hartig, CarstenYear:
2017
Language:
english
DOI:
10.1109/asmc.2017.7969192
File:
PDF, 543 KB
english, 2017