[IEEE 2017 28th Annual SEMI Advanced Semiconductor...

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[IEEE 2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2017.5.15-2017.5.18)] 2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - In-line control of material properties of SiOC:H based low-k dielectrics utilizing optical metrology AM: Advanced metrology

Urbanowicz, Adam M., Ebersbach, Peter, Likhachev, Dmitriy, Mezerette, David, Hartig, Carsten
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Year:
2017
Language:
english
DOI:
10.1109/asmc.2017.7969192
File:
PDF, 543 KB
english, 2017
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