Detecting and Preventing Gate Oxide Plasma Damage During...

IEEE Transactions on Semiconductor Manufacturing 2017 / 11 Vol. 30; Iss. 4

Detecting and Preventing Gate Oxide Plasma Damage During PECVD Carbon Deposition Through Surface Photovoltage Measurements

Fritz, Alan K., Olmer, Leonard J.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
30
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/TSM.2017.2757909
Date:
November, 2017
File:
PDF, 1.99 MB
english, 2017
Conversion to is in progress
Conversion to is failed