Particle Adsorption Onto Si-Based Wafers in Ultrapure...

IEEE Transactions on Semiconductor Manufacturing 2017 / 11 Vol. 30; Iss. 4

Particle Adsorption Onto Si-Based Wafers in Ultrapure Water; Its Mechanism and Effect of Carbon Dioxide

Nakata, Koji, Fukui, Takeo, Nagai, Tatsuo
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Volume:
30
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/tsm.2017.2759323
Date:
November, 2017
File:
PDF, 1.19 MB
english, 2017
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