![](/img/cover-not-exists.png)
Perfluorocompound Emissions Control and Kinetic Characteristics in Point-of-Use Wet-Thermal-Wet Abatement of Plasma-Enhanced Chemical Vapor Deposition Chamber Cleaning
Hu, Shih-Cheng, Shiue, Angus, Tseng, Wei-Ting, Leggett, GrahamYear:
2018
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/TSM.2018.2808173
File:
PDF, 802 KB
english, 2018