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Influence of ion bombardment on structural and electrical properties of SiO 2 thin films deposited from O 2 /HMDSO inductively coupled plasmas under continuous wave and pulsed modes
Bousquet, A., Goullet, A., Leteinturier, C., Coulon, N., Granier, A.Volume:
42
Language:
english
Journal:
The European Physical Journal Applied Physics
DOI:
10.1051/epjap:2008038
Date:
April, 2008
File:
PDF, 521 KB
english, 2008