Atomic layer deposited HfO 2 ultra-thin films on different...

Thin Solid Films 2018 / 05 Vol. 654

Atomic layer deposited HfO 2 ultra-thin films on different crystallographic orientation Ge for CMOS applications

Agrawal, Khushabu S., Patil, Vilas S., Mahajan, Ashok M.
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Volume:
654
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2018.03.083
Date:
May, 2018
File:
PDF, 2.76 MB
english, 2018
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