Direct atomic fabrication and dopant positioning in Si...

Nanotechnology 2018 / 06 Vol. 29; Iss. 25

Direct atomic fabrication and dopant positioning in Si using electron beams with active real-time image-based feedback

Jesse, Stephen, Hudak, Bethany M, Zarkadoula, Eva, Song, Jiaming, Maksov, Artem, Fuentes-Cabrera, Miguel, Ganesh, Panchapakesan, Kravchenko, Ivan, Snijders, Panchapakesan C, Lupini, Andrew R, Borisevi
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Volume:
29
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/1361-6528/aabb79
Date:
June, 2018
File:
PDF, 3.23 MB
english, 2018
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