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Thin films-preparation, structure and properties. Initial nucleation of photo-CVD amorphous silicon by photodecomposition of disilane.
KAWASAKI, Mitsuo, HAYASHI, Kazunori, TSUKIYAMA, Yoshio, HADA, HiroshiYear:
1987
Journal:
NIPPON KAGAKU KAISHI
DOI:
10.1246/nikkashi.1987.1928
File:
PDF, 3.57 MB
1987