Special Articles on Technology and Its Characterization for Synthesis of Inorganic Materials. Fluorination of Silica Surface by Tetrafluoromethane Plasma treatment and Its Relationship to Radical Formation and Exoelectron Emission.
MOMOSE, Yoshihiro, ISOZAKI, Toshio, OHISHI, Terue, OKAZAKI, SusumuYear:
1991
Journal:
NIPPON KAGAKU KAISHI
DOI:
10.1246/nikkashi.1991.1448
File:
PDF, 1.80 MB
1991