Low Pressure Thermal CVD Synthesis of Tungsten Nitride Thin Film Using WCl6 as Tungsten Source.
NAGAI, Masatoshi, KISHIDA, Koji, OMI, ShinzoYear:
1996
Journal:
NIPPON KAGAKU KAISHI
DOI:
10.1246/nikkashi.1996.368
File:
PDF, 5.30 MB
1996