![](/img/cover-not-exists.png)
Optimization of Lens Adjustment in Semiconductor Lithography Equipment Using Quadratically Constrained and Second Order Cone Programming(Mechanical Systems)
SHINANO, Yuji, YOSHIHARA, Toshiyuki, MIYASHIRO, Ryuhei, FUKAGAWA, YouzouVolume:
75
Year:
2009
DOI:
10.1299/kikaic.75.157
File:
PDF, 843 KB
2009