Influence of Wafer Edge Profile on STI-CMP Process...

  • Main
  • Influence of Wafer Edge Profile on...

Influence of Wafer Edge Profile on STI-CMP Process Performance : Examination Based on Surface Pressure of Wafer Calculated by FEM Analysis(Machine Elements, Design and Manufacturing)

FUKUDA, Akira, FUKUDA, Tetsuo, HIYAMA, Hirokuni, TSUJIMURA, Manabu, DOI, Toshiro, KUROKAWA, Syuhei, OHNISHI, Osamu
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
76
Year:
2010
DOI:
10.1299/kikaic.76.1610
File:
PDF, 973 KB
2010
Conversion to is in progress
Conversion to is failed