Application of Ion Beam Induced Chemical Vapor Deposition...

e-Journal of Surface Science and Nanotechnology 2015 Vol. 13

Application of Ion Beam Induced Chemical Vapor Deposition for SiC Film Formation on Si Substrates using Methylsilane

Yoshimura, Satoru, Sugimoto, Satoshi, Murai, Kensuke, Honjo, Kuniaki, Kiuchi, Masato
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
13
Year:
2015
Language:
english
Journal:
e-Journal of Surface Science and Nanotechnology
DOI:
10.1380/ejssnt.2015.174
File:
PDF, 318 KB
english, 2015
Conversion to is in progress
Conversion to is failed