Analysis of Resistivity Increase in Copper Nanoscale Interconnects Utilizing Monte Carlo Simulation and Optimum Wiring Structure to Suppress Resistivity Increase
WADA, Makoto, KURUSU, Takashi, ISOBAYASI, Atsunobu, KAJITA, Akihiro, TANIMOTO, Hiroyoshi, AOKI, Nobutoshi, TOYOSHIMA, Yoshiaki, SUGIZAKI, Yoshiaki, SHIBATA, HidekiVolume:
35
Year:
2014
Journal:
Hyomen Kagaku
DOI:
10.1380/jsssj.35.250
File:
PDF, 1.83 MB
2014