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Application of low hydrogen-diluted and low gaseous-pressure monosilane plasma to fast deposition of solar-cell-grade microcrystalline silicon
Tabuchi, Toshihiro, Toyoshima, Yasumasa, Fujimoto, Shinichi, Takashiri, MasayukiVolume:
41
Year:
2016
Language:
english
Journal:
Transactions of the Materials Research Society of Japan
DOI:
10.14723/tmrsj.41.385
File:
PDF, 890 KB
english, 2016