Material Temperature Dependence of the Retention and Sputtering Yield of Single-Crystal Graphite under Hydrogen Plasma Irradiation
SAITO, Seiki, TOKITANI, Masayuki, NAKAMURA, HiroakiVolume:
10
Year:
2015
Language:
english
Journal:
Plasma and Fusion Research
DOI:
10.1585/pfr.10.3403075
File:
PDF, 1.16 MB
english, 2015