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Low-temperature growth of oxide superconducting films by plasma-enhanced chemical vapor deposition(CVD).
Sugii, Nobuyuki, Kanehori, KeiichiVolume:
38
Year:
1991
Journal:
Journal of the Japan Society of Powder and Powder Metallurgy
DOI:
10.2497/jjspm.38.246
File:
PDF, 267 KB
1991