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Monitoring of Condition of Deposited Film Causing Particles in Plasma Etching by Using Practical Load Impedance Monitoring Method
KASASHIMA, Yuji, UESUGI, FumihikoVolume:
59
Year:
2016
Language:
english
Journal:
Journal of the Vacuum Society of Japan
DOI:
10.3131/jvsj2.59.270
File:
PDF, 2.23 MB
english, 2016