Plasma Damage during Sputtering of Tantalum Oxide Thin Films on MOS Substrate by Selected Methods.
MASUI, Kanji, NOMURA, Tsuyoshi, KWON, Sik-CholVolume:
44
Year:
1993
Journal:
Journal of the Surface Finishing Society of Japan
DOI:
10.4139/sfj.44.1108
File:
PDF, 654 KB
1993