Low Temperature Preparation of SnO2 Film by Photo CVD with Sn(CH3)4-O2 or O3 System.
PARK, Jung Il, ISHIDA, Tadashi, KIMURA, Saburo, TAMURA, Shigeharu, MIHARA, Toshiyuki, TABATA, OsamuVolume:
45
Year:
1994
Journal:
Journal of the Surface Finishing Society of Japan
DOI:
10.4139/sfj.45.547
File:
PDF, 253 KB
1994