ChemInform Abstract: DIRECT THERMAL NITRIDATION OF SILICON DIOXIDE FILMS IN ANHYDROUS AMMONIA GAS
ITO, T., NOZAKI, T., ISHIKAWA, H.Volume:
12
Journal:
Chemischer Informationsdienst
DOI:
10.1002/chin.198102032
Date:
January, 1981
File:
PDF, 139 KB
1981