Applying a new interatomic potential for the simulation of...

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Materials Chemistry and Physics 2018 / 3

Applying a new interatomic potential for the simulation of monoclinic and triclinic Li 4 SiO 4

Ma, Sheng-Gui, Kong, Xiang-Gang, Li, Shi-Chang, Shen, Yan-Hong, Chen, Xiao-Jun, Xiao, Cheng-Jian, Gao, Tao
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Language:
english
Journal:
Materials Chemistry and Physics
DOI:
10.1016/j.matchemphys.2018.03.073
Date:
March, 2018
File:
PDF, 1.47 MB
english, 2018
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