Reliability and characteristics of magnetron sputter deposited tantalum nitride for thin film resistors
Lee, Dong-Won, Kim, Yong-Nam, Cho, Myung-Yeon, Ko, Pil-Ju, Lee, Daeseok, Koo, Sang-Mo, Moon, Kyoung-Sook, Oh, Jong-MinLanguage:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2018.04.016
Date:
April, 2018
File:
PDF, 2.01 MB
english, 2018