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The effect of residual solvent on the profiles of thick positive DNO-photoresist for Microsystem Technologies
J. Schulz, T. Mono, S. J. Chung, J. MohrVolume:
2
Language:
english
Pages:
6
DOI:
10.1007/bf02447750
Date:
February, 1996
File:
PDF, 807 KB
english, 1996