On the Evolution of Strain and Electrical Properties in As-Grown and Annealed Si:P Epitaxial Films for Source-Drain Stressor Applications
Dhayalan, Sathish kumar, Kujala, Jiri, Slotte, Jonatan, Pourtois, Geoffrey, Simoen, Eddy, Rosseel, Erik, Hikavyy, Andriy, Shimura, Yosuke, Loo, Roger, Vandervorst, WilfriedVolume:
7
Year:
2018
Language:
english
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.0071805jss
File:
PDF, 1.24 MB
english, 2018