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Properties of Se-Ge inorganic photoresist as an ion-implantation mask
Yoshikawa, A., Tamama, T., Mizushima, Y., Kudo, K., Shigematsu, T.Volume:
15
Year:
1979
Language:
english
Journal:
Electronics Letters
DOI:
10.1049/el:19790360
File:
PDF, 408 KB
english, 1979