Diamine Adduct of Cobalt(II) Chloride as a Precursor for...

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Chemistry of Materials 2018 / 05

Diamine Adduct of Cobalt(II) Chloride as a Precursor for Atomic Layer Deposition of Stoichiometric Cobalt(II) Oxide and Reduction Thereof to Cobalt Metal Thin Films

Väyrynen, Katja, Hatanpää, Timo, Mattinen, Miika, Heikkilä, Mikko, Mizohata, Kenichiro, Meinander, Kristoffer, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku
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Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/acs.chemmater.8b01271
Date:
May, 2018
File:
PDF, 1.11 MB
english, 2018
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