Effects of the plasma-facing materials on the negative ion H- density in an ECR (2.45 GHz) plasma
Bentounes, Jounayd, Béchu, Stéphane Jean Louis, Biggins, Flora, Michau, Armelle, Gavilan, Lisseth, Menu, Johann, Bonny, Laurent, Fombaron, Dominique, Bès, Alexandre, Lebedev, Yu A, Shakhatov, ViacheslLanguage:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/1361-6595/aac0ed
Date:
April, 2018
File:
PDF, 1.11 MB
english, 2018