CH 3 Cl/Cu(410): Interaction and Adsorption Geometry
Makino, Takamasa, Zulaehah, Siti, Gueriba, Jessiel Siaron, Diño, Wilson Agerico, Okada, MichioLanguage:
english
Journal:
The Journal of Physical Chemistry C
DOI:
10.1021/acs.jpcc.8b01296
Date:
May, 2018
File:
PDF, 1.69 MB
english, 2018