Kinetics and mechanisms for ion-assisted etching of InP thin films in HBr + Cl 2 + Ar inductively coupled plasma with various HBr/Cl 2 mixing ratios
Kim, Changmok, Efremov, Alexander, Lee, Jaemin, Han, Il Ki, Kim, Young-Hwan, Kwon, Kwang-HoLanguage:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2018.05.018
Date:
May, 2018
File:
PDF, 2.17 MB
english, 2018