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Monitoring the removal of excited particles in He/Ar/H 2 low temperature afterglow plasma at 80–300 K
Kálosi, Ábel, Dohnal, Petr, Augustovičová, Lucie, Roučka, Štĕpán, Plašil, Radek, Glosík, Juraj, Gherardi, Nicolas, Marotta, Ester, Paradisi, CristinaVolume:
75
Language:
english
Journal:
The European Physical Journal Applied Physics
DOI:
10.1051/epjap/2016150587
Date:
August, 2016
File:
PDF, 733 KB
english, 2016