[IEEE 2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2017.5.15-2017.5.18)] 2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Nested interconnect macro electrical yield improvement for advanced triple patterning integration
Silvestre, Mary Claire, He, Ming, Mahalingam, Anbu Selvam K M, Child, Craig, Roux, Alycia, Low, Chun Hui, Fisher, Daniel, Zhou, Yue, Park, DeNeil, Karakoy, MertYear:
2017
DOI:
10.1109/asmc.2017.7969189
File:
PDF, 446 KB
2017