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[IEEE 2016 International Symposium on Semiconductor Manufacturing (ISSM) - Tokyo, Japan (2016.12.12-2016.12.13)] 2016 International Symposium on Semiconductor Manufacturing (ISSM) - Process Optimizer for adjusting film thickness and in-film dopant concentration at the same time
Takenaga, Yuichi, Kasai, Takahito, Komori, Katsuhiko, Hayashi, Hiroyuki, Ogawa, SatoruYear:
2016
Language:
english
DOI:
10.1109/ISSM.2016.7934535
File:
PDF, 7.67 MB
english, 2016