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(Invited) Process Variability for Devices at and Beyond the 7 nm Node
Lorenz, Juergen Klaus, Asenov, Asen, Baer, Eberhard, Barraud, Sylvain, Millar, Campbell, Nedjalkov, MihailVolume:
85
Language:
english
Journal:
ECS Transactions
DOI:
10.1149/08508.0113ecst
Date:
April, 2018
File:
PDF, 944 KB
english, 2018