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Reliability Wearout Mechanisms in Advanced CMOS Technologies || Electromigration
Strong, Alvin W., Wu, Ernest Y., Vollertsen, Rolf-Peter, Su, Jordi, La Rosa, Giuseppe, Rauch, Stewart E., Sullivan, Timothy D.Volume:
10.1002/97
Year:
2009
Language:
english
DOI:
10.1002/9780470455265.ch7
File:
PDF, 2.56 MB
english, 2009