Role of thin Ti layer in formation mechanism of low temperature-annealed Ti/Al-based ohmic contact on AlGaN/GaN heterostructure
Yoshida, Takahiro, Egawa, TakashiVolume:
33
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/1361-6641/aac3c3
Date:
July, 2018
File:
PDF, 894 KB
english, 2018