KrF Photoresist Profile Modulation by NH 3...

IEEE Transactions on Semiconductor Manufacturing 2018 / 5 Vol. 31; Iss. 2

KrF Photoresist Profile Modulation by NH 3 Plasma Treatment for 28 nm SRAM

Li, Run-Ling, Zhang, Jian, Wang, Lin-Lin, Jiang, Yu-Long
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Volume:
31
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/TSM.2018.2810854
Date:
May, 2018
File:
PDF, 976 KB
english, 2018
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