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Photosensitivity Characteristics of Novel Resists Consisting of a Photobase Generator and an Epoxy Resin
Terada, Kiwamu, Furutani, Masahiro, Arimitsu, KojiVolume:
30
Year:
2017
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.30.271
File:
PDF, 731 KB
english, 2017