High temperature water as a clean and etch of low-k and SiO...

Microelectronic Engineering 2018 / 09 Vol. 196

High temperature water as a clean and etch of low-k and SiO 2 films

Barclay, Joshua D., Okobiah, Oseoghaghare, Deng, Lu, Sengphanlaya, Tina, Du, Jincheng, Reidy, R.F.
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Volume:
196
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2018.04.016
Date:
September, 2018
File:
PDF, 1.69 MB
english, 2018
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