[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || Progress in 193-nm Single Layer Resists: The role of Photoacid Generator Structure on the Performance of Positive Resists
Ito, Hiroshi, Reichmanis, Elsa, Nalamasu, Omkaram, Ueno, TakumiVolume:
10.1021/bk
Year:
1998
Language:
english
DOI:
10.1021/bk-1998-0706.ch017
File:
PDF, 1.12 MB
english, 1998