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[ACS Symposium Series] Polymers for Microelectronics and Nanoelectronics Volume 874 || Utilizing Near Edge X-ray Absorption Fine Structure to Probe Interfacial Issues in Photolithography
Lin, Qinghuang, Pearson, Raymond A., Hedrick, Jeffrey C.Volume:
10.1021/bk
Year:
2004
Language:
english
DOI:
10.1021/bk-2004-0874.ch008
File:
PDF, 2.33 MB
english, 2004