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ChemInform Abstract: INTERFACE STABILITY IN THE ELECTROLYTIC DECOMPOSITION OF SILICON DIOXIDE FILMS AT ELEVATED TEMPERATURES
HINZE, J. W., BAKER, J. A., PATTERSON, J. W.Volume:
5
Journal:
Chemischer Informationsdienst
DOI:
10.1002/chin.197451019
Date:
December, 1974
File:
PDF, 216 KB
1974