ChemInform Abstract: CHEMICAL PROCESSES IN VAPOR DEPOSITION OF SILICON. I. DEPOSITION FROM DICHLOROSILANE AND ETCHING BY HYDROCHLORIC ACID
BAN, VLADIMIR S., GILBERT, STEPHEN L.Volume:
7
Journal:
Chemischer Informationsdienst
DOI:
10.1002/chin.197601014
Date:
January, 1976
File:
PDF, 127 KB
1976