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Interfacial and Electrical Properties of Ge MOS Capacitor by ZrLaON Passivation Layer and Fluorine Incorporation
Huang, Yong, Xu, Jing-Ping, Liu, Lu, Cheng, Zhi-Xiang, Lai, Pui-To, Tang, Wing-ManVolume:
229
Language:
english
Journal:
IOP Conference Series: Materials Science and Engineering
DOI:
10.1088/1757-899X/229/1/012018
Date:
September, 2017
File:
PDF, 781 KB
english, 2017