ChemInform Abstract: Thin Film Properties of Sputtered Niobium Silicide on SiO 2 , Si 3 N 4 , and N+ Poly-Si.
CHOW, T. P., LU, W. J., STECKL, A. J., BALIGA, B. J.Volume:
17
Journal:
Chemischer Informationsdienst
DOI:
10.1002/chin.198619329
Date:
May, 1986
File:
PDF, 212 KB
1986