Etch considerations for directed self-assembly patterning...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2018 / 05 Vol. 36; Iss. 3

Etch considerations for directed self-assembly patterning using capacitively coupled plasma

Rastogi, Vinayak, Ventzek, Peter L. G., Ranjan, Alok
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Volume:
36
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.5004648
Date:
May, 2018
File:
PDF, 2.82 MB
english, 2018
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