Study of the Intrinsic Limitations of the Contact Resistance of Metal/Semiconductor Interfaces through Atomistic Simulations
Dabral, A., Pourtois, G., Sankaran, K., Magnus, W., Yu, H., de Jamblinne de Meux, A., Lu, A. K. A., Clima, S., Stokbro, K., Schaekers, M., Collaert, N., Horiguchi, N., Houssa, M.Volume:
7
Year:
2018
Language:
english
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.0041806jss
File:
PDF, 1.02 MB
english, 2018