Thermal Stability of TiZrAlN and TiZrSiN Films Formed by...

Inorganic Materials: Applied Research 2018 / 5 Vol. 9; Iss. 3

Thermal Stability of TiZrAlN and TiZrSiN Films Formed by Reactive Magnetron Sputtering

Abadias, G., Daniliuk, A. Yu., Solodukhin, I. A., Uglov, V. V., Zlotsky, S. V.
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Volume:
9
Language:
english
Journal:
Inorganic Materials: Applied Research
DOI:
10.1134/S2075113318030024
Date:
May, 2018
File:
PDF, 911 KB
english, 2018
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