Dry etching of SrBi2Ta2O9: Comparison of inductively...

Korean Journal of Chemical Engineering 2002 / 05 Vol. 19; Iss. 3

Dry etching of SrBi2Ta2O9: Comparison of inductively coupled plasma chemistries

Jin Su Park, Tae Hee Kim, Chang Sun Choi, Yoon-Bong Hahn
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Volume:
19
Language:
english
Pages:
5
DOI:
10.1007/bf02697161
Date:
May, 2002
File:
PDF, 696 KB
english, 2002
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