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[IEEE 2017 IEEE International Integrated Reliability Workshop (IIRW) - Fallen Leaf Lake, CA (2017.10.8-2017.10.12)] 2017 IEEE International Integrated Reliability Workshop (IIRW) - Electromigration: Lognormal versus Weibull distribution
Basavalingappa, Adarsh, Passage, Jennifer M., Shen, Ming Y., Lloyd, J. R.Year:
2017
Language:
english
DOI:
10.1109/iirw.2017.8361224
File:
PDF, 458 KB
english, 2017